ASML and TSMC plan to move chipmaking from 6-inch to 12-inch photomasks so High NA EUV can print the largest AI processors, with production readiness in 2033.

Stitching to be used in the near term future with High-NA tools, but larger 6×12 photomasks envisioned.

Chiptechnologie: Chipmachinemaker ASML smeedt een coalitie van chipfabrikanten om zijn meest geavanceerde High-NA EUV-machine te upgraden, samen met chipgigant TSMC. Het doel:…