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Intel surpasses one million High-NA EUV wafers processed, outpaces the rest of the industry combined — company also trailblazing giant 6×12 photomasks to speed production and lower costs
Stitching to be used in the near term future with High-NA tools, but larger 6×12 photomasks envisioned.
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heise.de
Intel belichtet eine Million Wafer mit ASMLs 350-Millionen-Euro-Systemen
Intel setzt als erster Chipfertiger ASMLs neueste Lithografie-Systeme ein. Parallel läuft die Entwicklung größerer Masken.
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tomshardware.com
Intel surpasses one million High-NA EUV wafers processed, outpaces the rest of the industry combined — company also trailblazing giant 6×12…
Stitching to be used in the near term future with High-NA tools, but larger 6×12 photomasks envisioned.
