ASML has won over Samsung, TSMC, and Intel to switch to larger photomasks, which should boost the throughput of its newest EUV machines by 40 percent. Meanwhile, Huawei is orchestrating China's counter-strategy, aiming to break its dependence on the Dutch lithography technology through equipment maker Yuliangsheng and its own suppliers.

Chiptechnologie: Chipmachinemaker ASML smeedt een coalitie van chipfabrikanten om zijn meest geavanceerde High-NA EUV-machine te upgraden, samen met chipgigant TSMC. Het doel:…

Stitching to be used in the near term future with High-NA tools, but larger 6×12 photomasks envisioned.