Storia: Chip-Lithografie: High-NA EUV erstmals im Produktiveinsatz

WARPTECHNEWS · LAB

Following ‌experiments that ⁠began in ⁠2024, Intel has begun to use ASML's next-generation high numerical aperture (High NA) extreme ultraviolet (EUV) machines, which print…

Chip-Lithografie: High-NA EUV erstmals im Produktiveinsatz

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Chip-Lithografie: High-NA EUV erstmals im Produktiveinsatz

Timeline cronologica

Intel turns to next-generation ASML tool to help make its laptop chips

Intel Panther Lake chips: Intel turns to next-generation ASML tool to help make its laptop chips - The Economic Times

High NA EUV debutta nella produzione di massa: Intel realizza i primi chip Panther Lake con la tecnologia di…

Intel starts using ASML’s High NA EUV technology to produce chips - SiliconANGLE

Intel adopts ASML's next-generation tool for laptop chip production

Intel Is Shipping Panther Lake Chips Made With High-NA EUV; Apple, Nvidia and Broadcom Are the Real Test

Intel Panther Lake chips: Intel turns to next-generation ASML tool to help make its laptop chips - The…

Intel adopts ASML's next-generation tool for laptop chip production

ASML’s $400M chipmaking machine just shipped its first laptop processors

High NA EUV debutta nella produzione di massa: Intel realizza i primi chip Panther Lake con la tecnologia di ASML

ASML plans 30% increase in low-NA EUV production capacity by 2027

Intel Is Shipping Panther Lake Chips Made With High-NA EUV; Apple, Nvidia and Broadcom Are the Real Test

Chip-Lithografie: High-NA EUV erstmals im Produktiveinsatz

Intel starts using ASML’s High NA EUV technology to produce chips - SiliconANGLE