Intel is now using ASML’s High Numerical Aperture Extreme Ultraviolet, or High-NA EUV, equipment on selected layers of a subset of its Core Ultra Series 3 processors, better known as Panther Lake. ASML says the chips are shipping to customers and that yields on the affected layers match those produced using its established NXE EUV platform.The announcement establishes that High-NA EUV can participate in a commercial logic-chip manufacturing flow. It does not show that Intel has converted Panther Lake, the entire Intel 18A process or its main Arizona production line to the new equipment. Intel has not disclosed which layers are involved, how many wafers pass through the machine, or whether the High-NA process costs less than producing the same structures with conventional EUV.About The AuthorAt heart, I am a storyteller drawn to the watershed moments that bend the technology landscape. I braid narrative with data, humanise statistics, and trace the arc from first spark to world-changing impact. My reportage, features and reviews are witty, sardonic, visual and vivid, using anecdote to illuminate rather than eviscerate.
As a technology journalist with over sixteen years of experience, I have travelled the world and the seven seas, covered every major tech conference worth its lanyard, chronicled the defining breakthroughs of the last decade and a half, and played a pivotal role in launching some of India’s most important technology publishing platforms across web, print and TV.
