Huawei Technologies has engineered a workaround to one of China’s most crippling chipmaking bottlenecks, but analysts warn that the nation’s path to semiconductor independence is still constrained by manufacturing challenges.The US-sanctioned tech giant on Monday introduced a new scaling law and a chip architecture designed to deliver products equivalent to an advanced 1.4-nanometre processing node by 2031.If true, the innovation marks a significant milestone for Huawei, which has been cut off from advanced semiconductors, leading lithography machines from Dutch supplier ASML, and cutting-edge electronic design automation (EDA) tools since 2019.The company’s new Tau (τ) Scaling Law proposes a major shift in how chips are built. For decades, the industry advanced by physically shrinking transistors to pack more onto a silicon wafer. Huawei is betting instead on a concept called “time scaling”.Rather than trying to make the hardware components smaller, the firm aims to boost performance by compressing the effective time constant (τ) – essentially speeding up how fast signals travel across devices, circuits and systems.Under this new path, improvements in lithography tooling – the critical chokepoint in China’s semiconductor ambitions – are “not necessary”, according to He Tingbo, chair of Huawei Scientist Committee and president of the company’s semiconductor business department.
Huawei’s workaround for US chip curbs faces hurdles on road to self-reliance
If proven, the innovation marks a significant milestone for Huawei, which has been cut off from advanced semiconductor technology since 2019.










