Immersion deep-ultraviolet lithography machines are crucial to advanced chipmaking, and this marks a key step forward in Beijing’s drive to reduce its reliance on foreign technologies.
Shanghai Aishengna begins mass production of immersion DUV lithography machines, targeting five units in 2026 and 20 in 2027, advancing Beijing's semiconductor self-sufficiency. While the machines fall short of ASML's performance, they give Chinese chipmakers essential alternatives if Western export controls tighten.
East Asia
Immersion deep-ultraviolet lithography machines are crucial to advanced chipmaking, and this marks a key step forward in Beijing’s drive to reduce its reliance on foreign technologies.
A Chinese flag is displayed next to a printed circuit board with semiconductor chips on Feb 17, 2023. (Image: Reuters/Florence Lo)
29 Jul 2026 10:41AM
(Updated: 29 Jul 2026 10:45AM)
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