Entegris and JSR Corporation/Inpria Corporation Announce Non-Exclusive Cross-Licensing to EUV Lithography
Entegris, Inc. (Nasdaq: ENTG), a global leader in advanced materials and purity solutions for the semiconductor industry, and JSR Corporation, a materials innovation leader and the parent company of Inpria Corporation, today announced entry into a non-exclusive cross-licensing agreement aimed at helping the semiconductor industry advance extreme ultraviolet (EUV) lithography for next generation chip manufacturing.
“As the industry moves to smaller nodes, materials innovation, performance, purity, and reliability become inseparable,” said Olivier Blachier, SVP Chief Strategy & Innovation Officer at Entegris. “This cross-licensing reflects how innovation in semiconductors increasingly happens across the ecosystem, helping customers as they adopt next-generation lithography with greater confidence.”
Under the agreement, Entegris and Inpria will cross-license metal oxide resist (MOR) patents, terminate current Inter Partes Review challenges (IPR2025-00267), and explore collaborative opportunities on future photoresist materials. The work is intended to span resist formulation, precursor synthesis and development, and possibly ultra-clean MOR-specific filtration along with associated delivery systems needed to ensure these new materials perform consistently in high-volume manufacturing for EUV lithography applications.
