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UBS says China is unlikely to match ASML's top tool this decade
UBS says China will not match ASML's EUV tool this decade, but expects high-volume immersion DUV within two to five years. That is what The Hague licenses.
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thenextweb.com
UBS says China is unlikely to match ASML's top tool this decade
UBS says China will not match ASML's EUV tool this decade, but expects high-volume immersion DUV within two to five years. That is what The Hague licenses.
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tomshardware.com
China's DUV technology 'at a similar stage to ASML in 2004,' analyst claims — Beijing's semiconductor industry remains well behind Western…
Where are immersion DUV lithography scanners?
