ASML has announced that Intel is using its High NA EUV technology to manufacture its Intel Core Ultra Series 3 processors, code-named Panther Lake, built on Intel 18A process node technology.
Intel, which had its first High NA system delivered to its Hillsboro, Oregon, R&D facility in 2024, is using the tool to “pattern specific layers” on the chips, providing ASML and Intel Foundry with helpful data to further refine system setup, uptime, and manufacturing implementation.
– Intel
“With increased resolution and better process control, the introduction of High NA EUV marks a substantial development in semiconductor lithography,” said Christophe Fouquet, ASML president and CEO. “We are proud to play a role in enabling the smaller, denser patterning that will accelerate advancements in AI and other emerging technologies.”
The news comes as the Dutch lithography toolmaker published its Q2 2026 results, posting net sales of €9.3 billion ($10.6bn) for the three-month period, with net income totaling €2.9 billion ($3.3bn).
