Oxford Instruments has partnered with the NYU Nanofabrication Cleanroom to install a PlasmaPro ASP atomic layer deposition (ALD) system at the facility, the first in the US to be used for superconducting quantum applications.
Developed by Oxford Instruments and first launched in 2023, the PlasmaPro ASP ALD system was designed to produce superconducting nitrides essential for quantum applications, with the company saying it offers deposition rates three times faster than alternatives.
The PlasmaPro ASP installed in NYU Nanofab – Oxford Instruments
Atomic Layer Deposition is an advanced deposition technique that allows for ultra-thin films of a few nanometers to be deposited in a precisely controlled way, with the usage of plasma allowing for improved film properties and a wide range of possible materials.
The acquisition was funded by the US Microelectronics Commons through the NORDTECH hub, with the system directly supporting the Lab-to-Fab initiative to strengthen microelectronics research prototyping and workforce development, launched in 2022 under the US CHIPS and Science Act.
